Mgr. Peter Klein, Ph.D.

Výzkumný pracovník II, Deposition of Thin films and Nanostructures

correspondence Address:
Kotlářská 267/2, 611 37 Brno

e‑mail:

social and academic networks:

Basic information

Type

Total number of publications: 90

2024

Enhancement of ionized metal flux fraction without compromising deposition rate in industrial magnetron sputtering

KLEIN Peter HNILICA Jaroslav SOCHORA Vjačeslav SOUČEK Pavel FEKETE Matej VAŠINA Petr

Article in Periodical

Surface and Coatings Technology, year: 2024, volume: 489, edition: August 2024, DOI
On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species

HNILICA Jaroslav KLEIN Peter UČÍK Martin DEBNÁROVÁ Stanislava KLUSOŇ Jan VAŠINA Petr

Article in Periodical

Surface and Coatings Technology, year: 2024, volume: 487, edition: July 2024, DOI
Spatially resolved optical emission analysis of spokes in HiPIMS utilising Al, Cr, Cu, Ti, and W targets

HNILICA Jaroslav ŠLAPANSKÁ Marta KROKER Michael KLEIN Peter VAŠINA Petr

Article in Periodical

Plasma Sources Science and Technology, year: 2024, volume: 33, edition: 6, DOI
Technologie pro měření rychlosti růstu vrstvy a ionizace rozprášeného kovu při depozici s velmi vysokým výkonem

KLEIN Peter HNILICA Jaroslav VAŠINA Petr

Year: 2024

2023

Describing the multipulse HiPIMS deposition

HNILICA Jaroslav ONDRYÁŠ Martin SOUČEK Pavel KLEIN Peter FEKETE Matej VAŠINA Petr

Year: 2023, type:
Dynamics of sputtered particles in multipulse HiPIMS discharge

HNILICA Jaroslav KLEIN Peter VAŠINA Petr SNYDERS Rony BRITUN Nikolay

Article in Periodical

Plasma Sources Science and Technology, year: 2023, volume: 32, edition: 4, DOI
Enhancing the ionized metal flux fraction in industrial conditions

KLEIN Peter HNILICA Jaroslav SOCHORA V VAŠINA Petr

Conference abstract

Year: 2023, type: Conference abstract
Investigation of ionized metal flux fraction at industrial conditions

HNILICA Jaroslav KLEIN Peter SOCHORA V VAŠINA Petr

Conference abstract

Year: 2023, type: Conference abstract
NOVEL INDUSTRIAL SPUTTERING TECHNOLOGY WITH VERY HIGH IONIZED FLUX FRACTION OF DEPOSITED MATERIAL

KLUSOŇ Jan UČÍK Martin JÍLEK Mojmír HNILICA Jaroslav KLEIN Peter VAŠINA Petr LÜMKEMANN Andreas

Conference abstract

Year: 2023, type: Conference abstract
Novel Sputter Cathode Design to Obtain Very High Ionized Flux Fraction of Deposited Material in Industrial Conditions

UČÍK Martin HNILICA Jaroslav KLEIN Peter VAŠINA Petr KLUSOŇ Jan JÍLEK Mojmír ONDRYÁŠ Martin LÜMKEMANN A

Conference abstract

Year: 2023, type: Conference abstract